Products
- Vacuum Plasma Cleaning Machine
- Experimental plasma processor
- Miniature plasma processor
- Medium plasma processor
- PCB USES a horizontal plasma processor
- PCB USES a vertical plasma processor
- Roll to roll plasma processor
- Atmospheric Plasma Cleaning Machine
- Jet type atmospheric plasma processor
- AP type atmospheric plasma processor
- Custom pipelined equipment
- Vacuum Drying System
- Korea imports plasma equipment
- Korea PSM Plasma Cleaning Machine
- Korea LAT plasma equipment
- Vacuum plasma machine consumables
Contact Us
Telephone：86-0755-81452366
Fax：86-0755-81493996
Email：oksun001@szoksun.com
Address：A Xinlong Shenzhen Science Park Baoan District manhole Street King Hill Industrial 6 layer
Korea LAT plasma equipment
Standard plasma etcher ICP-RIE
ICP Power: 1000W (13.56mhz)
Offset power: 600 W (12.56 MHz)
Substrate size: Max 6 "wafer
Surface cooling: Back cooling
Heat exchanger: -30 ℃ ~ 100 ℃
System control: PLC + touch (Manual L)
Optional:
Automatic CNC, data recording (PLC + PC)
Process parameters of plasma etcher
The Word Best Plasma
Contact: Mr. Yu, Mr. Tang
Tel:13612999216 13632910173