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Standard evaporator
Introduction

Deposition source: electron beam + rising hot gas stream

Substrate size: ~ 8 inches

Substrate temperature: Max 500℃ (continuous use standard)

System control: PLC + touch (manual)

Optional: Load lock system, preprocessing unit

Automatic CNC, data recording (PLC + PC)

Substrate cooling

Evaporator process parameters

蒸发器工艺参考
 

The Word Best Plasma
Contact: Mr. Yu, Mr. Tang
Tel:13612999216 13632910173
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